半导体学报2009，Vol.30Issue(1)：014006-1-014006-5,2.DOI:10.1088/1674-4926/30/1/014006
Design and fabrication of an embedded wire-grid nanograting
Design and fabrication of an embedded wire-grid nanograting
摘要
Abstract
An embedded wire-grid nanograting was designed and fabricated for using as a broadband polarizing beam splitter to reflect s-polarized light and transmit p-polarized light. A protected cladding layer of the same material as the grating's was deposited on the ridge, whereas the wire-grid is deposited in the grating trenches, which makes it more firm during application. High polarization extinction ratios of above 40 and 20 dB for transmission and reflection, respectively, with a broad wavelength range for the whole optical communication bandwidth (850-1700 nm) and a wide angular tolerance (> ±20°) are obtained by optimization of the designed structures, and the grating period is 200 nm.关键词
polarizing beam splitter/ wire-grid nanograting/ extinction ratioKey words
polarizing beam splitter/ wire-grid nanograting/ extinction ratio分类
信息技术与安全科学引用本文复制引用
Zhou Libing,Zhu Wei..Design and fabrication of an embedded wire-grid nanograting[J].半导体学报,2009,30(1):014006-1-014006-5,2.基金项目
Project supported by the National Natural Science Foundation of China (No.60707017) and the Science and Technology Plan of ZhejiangProvince, China (No.2006C1005). （No.60707017）
