无机材料学报2000，Vol.15Issue(6)：1127-1130,4.
ZnS薄膜的溅射沉积及其XPS研究
Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film
周咏东 1方家熊 2李言谨 2龚海梅 2汤定元2
作者信息
- 1. 苏州大学物理系，苏州215006
- 2. 中国科学院上海技术物理研究所，上海200083
- 折叠
摘要
Abstract
The ZnS film was grown on HgCdTe surface by using the low-temperature ion beam sputtering technique. Zn and S elements in the sputtering ZnS film sample were studied and compared with those in the evaporating ZnS film by using X-ray photoelectron spectroscopy (XPS)technique. It is proved that the constituent elements are homogeneous, and the deposition of element Zn, S cannot be detceted in the sputtering ZnS film.关键词
ZnS/离子束溅射沉积/XPS/HgCdTe/表面抗反射膜Key words
ZnS/ion beam sputtering deposition technique/XPS/HgCdTe/surface anti-reflection coat分类
数理科学引用本文复制引用
周咏东,方家熊,李言谨,龚海梅,汤定元..ZnS薄膜的溅射沉积及其XPS研究[J].无机材料学报,2000,15(6):1127-1130,4.
