半导体学报2004，Vol.25Issue(11)：1360-1363,4.
偏振不灵敏硅基二氧化硅阵列波导光栅设计
Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design
摘要
Abstract
A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.The results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.关键词
硅基二氧化硅/阵列波导光栅/应力/双折射/偏振相关波长/数值分析Key words
silica on silicon/arrayed waveguide grating/stress/birefringence/polarization dependent wavelength/numerical analysis分类
信息技术与安全科学引用本文复制引用
安俊明,李健,郜定山,夏君磊,李建光,王红杰,胡雄伟..偏振不灵敏硅基二氧化硅阵列波导光栅设计[J].半导体学报,2004,25(11):1360-1363,4.基金项目
国家重点基础研究发展规划(批准号:G2000036602),国家高技术研究发展计划(批准号:2002AA312260)和国家自然科学基金(批准号:69889701)资助项目 （批准号:G2000036602）
