高压电器2001，Vol.37Issue(1)：14-16,3.
曝光量对介质阻挡放电照相的影响
EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY
翁明 1陈启升 2吴日赐3
作者信息
- 1. 西安交通大学,
- 2. 广东福地科技股份有限公司,
- 3. 上海永新彩色显象管有限公司,
- 折叠
摘要
Abstract
In this paper, the basic principle of dielectric barrier discharge photography(DBDP) is discussed. An imaging equipment is set up for the purpose of studying the effect of exposure on the DBDP, by which this influences of exposure time and resistance in discharge circuit on the quality of DBDP are studied, respectively. Based on this results, the author advances that in the premise of using high-voltage nanosecond pulse discharge technology, controlling the exposure time and the resistance synthetically is a key for getting a good image of DBDP.关键词
介质阻挡放电照相/纳秒脉冲/汞润触点继电器分类
数理科学引用本文复制引用
翁明,陈启升,吴日赐..曝光量对介质阻挡放电照相的影响[J].高压电器,2001,37(1):14-16,3.
