半导体学报2009,Vol.30Issue(3):15-18,4.DOI:10.1088/1674-4926/30/3/033001
Optical and electrical properties of N-doped ZnO and fabrication of thin-film transistors
Optical and electrical properties of N-doped ZnO and fabrication of thin-film transistors
摘要
Abstract
Using NH3 as nitrogen source gas, N-doped ZnO (ZnO:N) thin films in c-axis orientation were deposited on glass substrates by radio frequency magnetron sputtering at room temperature. The ZnO:N thin films display significant increase of resistivity and decrease of photoluminescence intensity. As-grown ZnO:N material was used as active channel layer and Si3N4 was used as gate insulator to fabricate thin-film transistor. The fabricated devices on glasses demonstrate typical field effect transistor characteristics.关键词
ZnO/N-doping/resistivity/photoluminescence/thin film transistorsKey words
ZnO/N-doping/resistivity/photoluminescence/thin film transistors分类
信息技术与安全科学引用本文复制引用
Zhu Xiaming,Wu Huizhen,Wang Shuangjiang,Zhang Yingying,Cai Chunfeng,Si Jianxiao,Yuan Zijian,Du Xiaoyang,Dong Shurong..Optical and electrical properties of N-doped ZnO and fabrication of thin-film transistors[J].半导体学报,2009,30(3):15-18,4.基金项目
Project supported by the National Natural Science Foundation of China (No. 60676003) and the Natural Science Foundation of Zhejiang Province (No. Z406092). (No. 60676003)