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6H-SiC反型层电子库仑散射

尚也淳 张义门 张玉明

西安电子科技大学学报(自然科学版)2001,Vol.28Issue(2):154-157,4.
西安电子科技大学学报(自然科学版)2001,Vol.28Issue(2):154-157,4.

6H-SiC反型层电子库仑散射

Study of coulomb scattering in 6H-SiC inversion layers

尚也淳 1张义门 1张玉明1

作者信息

  • 1. 西安电子科技大学 微电子所,陕西 西安 710071
  • 折叠

摘要

Abstract

A comprehensive analytical model for coulomb scattering in 6H-SiCinversion layers is presented considering all the coulomb effects of the charged-centers near the SiC/SiO2 interface. This model takes into account the effects of the charged-centers correlation. The electron mobility in 6H-SiC inversion layers has been studied by the single-particle Monte Carlo technique. The simulation results agree with the experimental data very well. The study shows that coulomb scattering becomes more important at low transverse-electric field and both the density and the distribution of charged-cneters play an important role in electron transport in SiC inversion layers.

关键词

6H-SiC/反型层迁移率/库仑散射/Monte Carlo模拟

分类

信息技术与安全科学

引用本文复制引用

尚也淳,张义门,张玉明..6H-SiC反型层电子库仑散射[J].西安电子科技大学学报(自然科学版),2001,28(2):154-157,4.

西安电子科技大学学报(自然科学版)

OA北大核心CSCD

1001-2400

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