材料科学与工程学报2009，Vol.27Issue(2)：157-160,4.
中频磁控溅射NiOx电致变色薄膜
Electrochromic Performances of Nanosized Nickel Oxide Films Deposited by Mid-frequency Magnetron Sputtering
王丽阁 1李剑锋 2李国卿1
作者信息
- 1. 大连理工大学三束材料改性国家重点实验室,辽宁,大连,116024
- 2. 大连交通大学,辽宁,大连,116028
- 折叠
摘要
Abstract
Nanosized nickel oxide (NiO.) films are deposited by mid-frequency dual-target magnetron sputtering method. The structure, morphology composition and transmittance properties of the films are characterized by atom force microscope (AFM), grazing-incidence X-ray diffraction (GID), electrochemical experiment and spectrophotometer. The results show that the as-deposited films prepared at room temperature are of relatively clean surface. Under ±3V, the films have good electroehromic properties whose different transmittance between the bleached and colored states in the visible region reaches 30%, while have relative low lifetime. The structure of as-deposited nanosized NiOx films is beneficial for ions' injec-tion and extraction while irreversible injection can easily occur under high applied voltage.关键词
电致变色/NiOx/磁控溅射/纳米晶Key words
electrochromic/NiOx/magnetron sputtering/nano crystallites分类
数理科学引用本文复制引用
王丽阁,李剑锋,李国卿..中频磁控溅射NiOx电致变色薄膜[J].材料科学与工程学报,2009,27(2):157-160,4.
