半导体学报2008，Vol.29Issue(1)：17-19,3.
用发光显微镜测试控制先进CMOS工艺的多晶硅刻蚀时间
Polysilicon Over-Etching Time Control of Advanced CMOS Processing with Emission Microscopy
赵毅 1万星拱2
作者信息
- 1. 东京大学材料系,东京,113-8656,日本
- 2. 上海集成电路研发中心,上海,201203
- 折叠
摘要
Abstract
The emission microscopy (EMMI) test is proposed as an effective method to control the polysilicon over-etching time of advanced CMOS processing combined with a novel test structure,named a poly-edge structure. From the values of the breakdown voltage (Vbd) of MOS capacitors (poly-edge structure) ,it was observed that,with for the initial polysilicon etching-time, almost all capacitors in one wafer failed under the initial failure model. With the increase of polysilicon overetching time, the number of the initial failure capacitors decreased. Finally, no initial failure capacitors were observed after the polysilicon over-etching time was increased by 30s. The breakdown samples with the initial failure model and intrinsic failure model underwent EMMI tests. The EMMI test results show that the initial failure of capacitors with poly-edge structures was due to the bridging effect between the silicon substrate and the polysilicon gate caused by the residual polysilicon in the ditch between the shallow-trench isolation region and the active area, which will short the polysilicon gate with silicon substrate after the silicide process.关键词
多晶硅刻蚀/栅氧可靠性/发光显微镜Key words
polysilicon over-etching/ gate oxide reliability/ emission microscopy分类
信息技术与安全科学引用本文复制引用
赵毅,万星拱..用发光显微镜测试控制先进CMOS工艺的多晶硅刻蚀时间[J].半导体学报,2008,29(1):17-19,3.
