液晶与显示2009，Vol.24Issue(2)：183-186,4.
利用射频磁控溅射法在柔性衬底上制备ZnO∶Zr透明导电薄膜
Fabrication of ZnO∶Zr Film Deposited on Flexible Substrate by RF Magnetron Sputtering
刘汉法 1张化福 1类成新 1袁玉珍 1袁长坤1
作者信息
- 1. 山东理工大学,物理与光电信息技术学院,山东,淄博,255049
- 折叠
摘要
Abstract
Zirconium-doped zinc oxide (ZnO∶Zr) transparent conducting thin films with high transmittance, low resistivity and good adhesion were firstly prepared on water-cooled polyethylene glycol terephthalate flexible substrates by RF magnetron sputtering. X-ray diffraction and scanning electron microscopy show that the ZnO∶Zr films are polycrystalline with a hexagonal structure and a preferred orientation parallel to the substrate. The lowest resistivity obtained in our experiment is 1.55×10-3 Ω·cm. The average transmittance of the films is over 90% in the wavelength range of the visible spectrum.关键词
ZnO∶Zr薄膜/柔性衬底/磁控溅射/透明导电薄膜Key words
ZnO∶Zr films/ flexible substrates/ magnetron sputtering/ transparent conducting films分类
信息技术与安全科学引用本文复制引用
刘汉法,张化福,类成新,袁玉珍,袁长坤..利用射频磁控溅射法在柔性衬底上制备ZnO∶Zr透明导电薄膜[J].液晶与显示,2009,24(2):183-186,4.
