物理学报2009，Vol.58Issue(z1)：199-203,5.
MgO(001)表面上沉积MgO薄膜过程的分子动力学模拟
Deposition process of MgO thin film on MgO(001) surface simulated by molecular dynamics
摘要
Abstract
Molecular dynamics is used to simulate the deposition process of MgO molecules on MgO(001) surface,and substrate temperature and molecular incident energy are discussed in terms of their effects on the diffusivity of MgO molecules and the substrate surface coverage ratio. The simulated results show that with the substrate temperature increasing, vacant sites in MgO film decrease, owing to the increase in diffusivity of the deposited molecules on the substrate. At low temperatures, the substrate surface coverage ratio increases with molecular incident energy increasing. At high temperatures, the surface coverage ratio reaches the maximum at an incident energy of 3.0 eV, and then it decreases with the increase of incident energy.关键词
MgO薄膜生长/分子动力学/计算机模拟/表面扩散Key words
MgO thin film growth/molecular dynamics/computer simulation/surface diffusion分类
数理科学引用本文复制引用
刘美林,张宗宁,李蔚,赵骞,祁阳,张林..MgO(001)表面上沉积MgO薄膜过程的分子动力学模拟[J].物理学报,2009,58(z1):199-203,5.基金项目
国家自然科学基金(批准号:50572013)资助的课题.Project supported by the National Natural Science Foundation of China (Grant No . 50572013). （批准号:50572013）
