福州大学学报（自然科学版）2001，Vol.29Issue(1)：20-21，19,3.
基体/介质/金属双层薄膜内应力的研究
A study on internal stress of dielectric and metal double-layer thin films
摘要
Abstract
The silicon nitride dielectric thin film and NiCr alloy thin filmwere prepared by PECVD and sputtering methods. The internal stress of the double-layer thin films were measured by using laser beam planar interference and the relationship between stress, thickness and the two-layer system were analysed.关键词
双层薄膜/平面干涉法/内应力分类
数理科学引用本文复制引用
于映,陈跃..基体/介质/金属双层薄膜内应力的研究[J].福州大学学报（自然科学版）,2001,29(1):20-21，19,3.
