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制备工艺对HfO2薄膜抗激光损伤能力的影响

马平 柴林 邱服民 顾元元

强激光与粒子束2001,Vol.13Issue(1):31-33,3.
强激光与粒子束2001,Vol.13Issue(1):31-33,3.

制备工艺对HfO2薄膜抗激光损伤能力的影响

Influence of preparation process on laser induced damage threshold of HfO2 films

马平 1柴林 1邱服民 1顾元元1

作者信息

  • 1. 成都精密光学工程研究中心,
  • 折叠

摘要

Abstract

A series of films were prepared by reactive evaporation. Themicrostructure defects on film surfaces and effect of substrate cleaning procedures on laser induced damage threshold were investigated. The RMS surface roughness of uncoated and coated substrates were measured. It was shown that the coating process could increase or decrease the surface roughness and had obvious effects on damage threshold.

关键词

HfO2薄膜/表面粗糙度/激光损伤

分类

信息技术与安全科学

引用本文复制引用

马平,柴林,邱服民,顾元元..制备工艺对HfO2薄膜抗激光损伤能力的影响[J].强激光与粒子束,2001,13(1):31-33,3.

基金项目

中国工程物理研究院科技基金资助项目( ()

强激光与粒子束

OA北大核心CSCD

1001-4322

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