南京航空航天大学学报（英文版）2007，Vol.24Issue(4)：317-322,6.
栅极偏压对纳米金刚石薄膜沉积过程的影响
EFFECT OF GRID BIAS ON DEPOSITION OF NANOCRYSTALLINE DIAMOND FILMS
摘要
Abstract
A positive grid bias and a negative substrate bias voltages are applied to the self-made hot filament chemical vapor deposited (HFCVD) system. The high quality nanocrystalline diamond (NCD) film is successfully deposited by double bias voltage nucleation and grid bias voltage growth. The Micro-Raman XRD SEM and AFM are used to investigate the diamond grain size, microstructure, surface morphology, and nucleation density. Results show that the obtained NCD has grain size of about 20 nm. The effect of grid bias voltage on the nucleation and the diamond growth is studied. Experimental results and theoretical analysis show that the positive grid bias increases the plasma density near the hot filaments, enhances the diamond nucleation, keeps the nanometer size of the diamond grains, and improves the quality of diamond film.关键词
纳米金刚石薄膜/热丝化学气相沉积法/衬底偏压/栅极偏压/成核Key words
nanocrystalline diamond film/ hot filament CVD/ substrate bias voltage/ grid bias voltage/ nucleation分类
矿业与冶金引用本文复制引用
徐锋,左敦稳,卢文壮,王珉..栅极偏压对纳米金刚石薄膜沉积过程的影响[J].南京航空航天大学学报（英文版）,2007,24(4):317-322,6.基金项目
Supported of the National Natural Science Foundation of China(50605032) （50605032）
the Natural Science Foundation of Jiangsu Province(BK2007193).国家自然科学基金(50605032)资助项目 （BK2007193）
江苏省自然科学基金(BK2007193)资助项目. （BK2007193）
