半导体学报2003，Vol.24Issue(4)：357-361,5.
一种基于卷积核用于光刻模拟的计算稀疏空间点光强的方法
A Kernel-Based Convolution Method to Calculate Sparse Aerial Image Intensity for Lithography Simulation
摘要
Abstract
Optical proximity correction (OPC) systems require an accurate and fast way to predict how patterns will be transferred to the wafer.Based on Gabor's "reduction to principal waves",a partially coherent imaging system can be represented as a superposition of coherent imaging systems,so an accurate and fast sparse aerial image intensity calculation algorithm for lithography simulation is presented based on convolution kernels,which also include simulating the lateral diffusion and some mask processing effects via Gaussian filter.The simplicity of this model leads to substantial computational and analytical benefits.Efficiency of this method is also shown through simulation results.关键词
光刻仿真/光学邻近校正/卷积核Key words
lithography simulation/optical proximity correction/convolution kernels分类
信息技术与安全科学引用本文复制引用
史峥,王国雄,严晓浪,陈志锦,高根生..一种基于卷积核用于光刻模拟的计算稀疏空间点光强的方法[J].半导体学报,2003,24(4):357-361,5.基金项目
国家自然科学基金资助项目(批准号:60176015) （批准号:60176015）
