哈尔滨工业大学学报（英文版）2003，Vol.10Issue(4)：408-412,5.
Nanoindentation tests on single crystal copper thin film with an AFM
Nanoindentation tests on single crystal copper thin film with an AFM
摘要
Abstract
Nanoindentation tests performed in a commercial atomic force microscope have been utilized to directly measure the elastic modulus and the hardness of single crystal copper thin films fabricated by the vacuum vapor deposition technique. Nanoindentation tests were conducted at various indentation depths to study the effect of indentation depths on the mechanical properties of thin films. The results were interpreted by using the Oliver-Pharr method with which direct observation and measurement of the contact area are not required. The elastic modulus of the single crystal copper film at various indentation depths was determined as (67. 0 ±6. 9) GPa on average which is in reasonable agreement with the results reported in literature. The indentation hardness constantly increases with decreasing indentation depth, indicating a strong size effect.关键词
nanoindentation/atomic force microscope/thin film/mechanical property/hardness/elastic modulusKey words
nanoindentation/atomic force microscope/thin film/mechanical property/hardness/elastic modulus分类
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霍德鸿,梁迎春,程凯,董申..Nanoindentation tests on single crystal copper thin film with an AFM[J].哈尔滨工业大学学报（英文版）,2003,10(4):408-412,5.基金项目
Sponsored by the National Natural Science Foundation of China (Grant No. 50175017 ) and Interdiscipline Foundation of Harbin Institute of Technology( Grant No. HIT. MD. 2000.9 ). （Grant No. 50175017 ）
