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Photo-sensitive characteristics of negative resistance turn-around occurring in SIPTH

Ji Tao Yang Licheng Li Hairong He Shanhu Li Siyuan

半导体学报2009,Vol.30Issue(4):41-44,4.
半导体学报2009,Vol.30Issue(4):41-44,4.DOI:10.1088/1674.4926/30/4/044006 PACC:6855;7340Q;7340T EEACC:2550;2560R

Photo-sensitive characteristics of negative resistance turn-around occurring in SIPTH

Photo-sensitive characteristics of negative resistance turn-around occurring in SIPTH

Ji Tao 1Yang Licheng 2Li Hairong 2He Shanhu 2Li Siyuan2

作者信息

  • 1. School of Fundamental Studies,Shanghai University of Engineering Science,Shanghai 201620,China
  • 2. Institute of Microelectronics,School of Physical Science and Technology,Lanzhou University,Lanzhou 730000,China
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摘要

Abstract

Influences of light irradiation on the negative resistance turn-around characteristics of static induction photosensitive thyristor(SIPTH)have been experimentally and theoretically studied.As the gate current of SIPTH is increased by the light irradiation,the potential barrier in the channel is reduced due to the increase in voltage drop across the gate series resistance.Therefore.SIPTH Can be quickly switched from the blocking state to the conducting state by relatively low anode voltage.The optimal matching relation for controlling anode conducting voltage of SIPTH by light irradiation has also been represented.

关键词

static induction photosensitive thyristors/gate series resistance/double injection effect/potential bar tier/light-generated carriers

Key words

static induction photosensitive thyristors/gate series resistance/double injection effect/potential bar tier/light-generated carriers

分类

信息技术与安全科学

引用本文复制引用

Ji Tao,Yang Licheng,Li Hairong,He Shanhu,Li Siyuan..Photo-sensitive characteristics of negative resistance turn-around occurring in SIPTH[J].半导体学报,2009,30(4):41-44,4.

基金项目

Project supported by the Training of Outstanding Young Teachers Project in Colleges in Shanghai(No.gjd-07037). (No.gjd-07037)

半导体学报

OA北大核心CSCDCSTPCDEI

1674-4926

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