感光科学与光化学2004，Vol.22Issue(6)：444-454,11.
集成高分子光子学器件平台
Integrated Polymer Photonic Device Platform
Aydin Yeniay 1高任峰 1蔡永明 1朱劲松2
作者信息
- 1. Photon-X,LLC,283 Great Valley Parkway,Malvem,PA,19355,USA
- 2. 中国科学院,理化技术研究所,北京,100101
- 折叠
摘要
Abstract
Single mode perfluoropolymer waveguide structures, fabricated on polymer substrates for athermal operation, exhibit polarization independent, ultra low loss of＜0.04 and ＜ 0.05 dB/cm at 1310 and 1550 nm, respectively. Porous structure that arises during the fabrication process is studied by considering its implications in the propagation loss. We demonstrate that porous structure is to be reduced to nanoscale, in order to realize waveguides structure with ultralow propagation losses. These waveguide architectures form the basis for a new photonic polymer device technology platform for high performance integrated devices.关键词
全氟高分子/纳米加工/光损耗/孔道波导Key words
perfluoro-polymer/nano fabrication/optical loss/channel waveguide分类
化学化工引用本文复制引用
Aydin Yeniay,高任峰,蔡永明,朱劲松..集成高分子光子学器件平台[J].感光科学与光化学,2004,22(6):444-454,11.
