武汉化工学院学报2001，Vol.23Issue(2)：44-46,3.
WC-Co硬质合金上高质量金刚石薄膜的制备
Preparation of high quality diamond films on WC-Co substrates
马志斌 1汪建华 2邬钦崇 3王传新4
作者信息
- 1. 武汉化工学院材料科学与工程系
- 2. 中国科学院等离子体物理研究所
- 3. 武汉化工学院材料科学与工程系,
- 4. 中国科学院等离子体物理研究所,
- 折叠
摘要
Abstract
Diamond films were prepared on WC-Co substrates with microwave plasma chemical vapor deposition. The effects of different pretreatments including acid etching and copper interlayer and deposition conditions on the quality of diamond films were studied. The result of this study shows that the quality of diamond film is good with moderate conditions of gas pressure 6.0 kPa and substrate temperature 780 ℃.关键词
金刚石薄膜/硬质合金/薄膜质量分类
数理科学引用本文复制引用
马志斌,汪建华,邬钦崇,王传新..WC-Co硬质合金上高质量金刚石薄膜的制备[J].武汉化工学院学报,2001,23(2):44-46,3.
