中山大学学报(自然科学版)2003，Vol.42Issue(z1)：45-46,2.
电化学沉积Cu-In-Se薄膜
Electrochemical Deposition of Cu-In-Se Thin Films
摘要
Abstract
Cu-Se, In-Se and Cu-In-Se thin films have been prepared by electrodepositing method on molybdenum substrates. This paper measures parameter of the electrodeposition process, and discovers the Cu-In-Se thin films are induced codeposition. The Cu-In-Se is not stoichiometric ratio, but is provided with photoelectricity property.关键词
电沉积/CuInSe2/诱导共沉积Key words
electrodeposition/CuInSe2/induced codeposition分类
能源科技引用本文复制引用
敖建平,孙国忠,夏晓丽..电化学沉积Cu-In-Se薄膜[J].中山大学学报(自然科学版),2003,42(z1):45-46,2.基金项目
This project is supported by JiangXi Provincial Natural Science Foundation of China. （）
