液晶与显示2007，Vol.22Issue(5)：529-534,6.
EA-HFCVD 沉积纳米金刚石膜的光致发光分析
Photoluminescence Analysis of Nanocrystalline Diamond Films Deposited by EA-HFCVD
摘要
Abstract
Nano-crystalline diamond films with a grain size of 30 nm were deposited on pretreated Si wafer surface via electron assisted-hot filament chemical vapor deposition method with a bias current of 6 A applied for 1 h, followed with no bias current for 3 h at 0.8 kPa gas pressure. A photoluminescence (PL) study was carried out by Raman spectrometer in the wavelength range of 700～900 nm. Four emission bands centered at 1.682 eV, 1.564 eV, 1.518 eV and 1.512 eV were observed. The 1.682 eV feature was attributed to the silicon impurity from the substrate, the 1.564 eV feature to the local vibration mode of the defect, and the others bands to diamond lattice phonons. The higher the PL intensity is, the more the defects have and the lower the threshold field is. The key of the mechanism for this result may be due to conducting grain boundaries, which allows the field emission to be much easier.关键词
光致发光/纳米金刚石膜/电子辅助-热丝化学气相沉积Key words
photoluminescence/nano-crystalline diamond films/hot filament chemical vapor deposition分类
信息技术与安全科学引用本文复制引用
祝雪丰,王林军,胡广,刘健敏,黄健,徐金勇,夏义本..EA-HFCVD 沉积纳米金刚石膜的光致发光分析[J].液晶与显示,2007,22(5):529-534,6.基金项目
Supported by National Natural Science Foundation of China (No.60577040) （No.60577040）
Shanghai Foundation of Applied Materials Research and Development (No.0404) （No.0404）
Nano-technology Project of Shanghai (No.0452nm051, No.0552nm046) （No.0452nm051, No.0552nm046）
Shanghai Leading Academic Disciplines (No.T0101) （No.T0101）
