长春大学学报（自然科学版）2009，Vol.19Issue(3)：57-59,3.
射频磁控溅射制备SiO2防离子反馈膜工艺探讨
Preparation of SiO2 ion barrier film with RF magnetron sputtering
孙鹏凯1
作者信息
- 1. 长春大学,理学院,吉林,长春,130022
- 折叠
摘要
Abstract
In this paper, we use RF magnetron sputtering method and succeed in preparation of SiO2 ion barrier film that meets the re-quirements of application on MCP surface. We analyze the ion barrier film in theory, and the electron transmittance test has been con-ducted on the SiO2 ion barrier film prepared.关键词
微通道板/二氧化硅/防离子反馈膜Key words
microchannel plate/SiO2/ion barrier film分类
数理科学引用本文复制引用
孙鹏凯..射频磁控溅射制备SiO2防离子反馈膜工艺探讨[J].长春大学学报（自然科学版）,2009,19(3):57-59,3.
