光学精密工程2000，Vol.8Issue(1)：66-70,5.
软X射线投影光刻原理装置的设计
Development of elementary arrangement for soft X-ray projection lithography
金春水 1王占山 1曹健林1
作者信息
- 1. 中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林,长春,130021
- 折叠
摘要
Abstract
The prototype for soft X－ray projection lithograph y at 13nm wavelength is introduced. It includes a laser plasma source, an ellips oidal condenser, a transmission mask, the Schwarzschild objective, a wafer and t he associated vacuum apparatus. The optical design is optimized to achieve small er resolution than 0.2μm over a 0.1mm diameter image field of view.关键词
软X射线投影光刻/多层膜反射镜/软X射线投影光刻原理装置/激光等离子体光源Key words
soft X-ray projection lithography/multilayer reflector/laser plasma source/e lementary arrangement for soft X-ray projection lithography分类
信息技术与安全科学引用本文复制引用
金春水,王占山,曹健林..软X射线投影光刻原理装置的设计[J].光学精密工程,2000,8(1):66-70,5.
