人工晶体学报2004，Vol.33Issue(4)：667-669,617,4.
直流反应磁控溅射法制备二氧化钛薄膜的光响应
Photoresponse of TiO2 Thin Films Deposited by DC Reactive Magnetron Sputtering
张利伟 1张兵临 1姚宁 1樊志琴 1杨仕娥 1鲁占灵1
作者信息
- 1. 郑州大学物理工程学院材料物理重点实验室,郑州,450052
- 折叠
摘要
Abstract
TiO2 thin films were prepared by DC reactive magnetron sputtering on ITO surface which deposited on glass substrates. The structure of TiO2 thin films was studied by Raman spectrum and the absorption spectra. The photoresponses of TiO2 thin films were investigated in virtue of photocurrent. The photoresponse time is less than 100s when photocurrent reaches 96% of the maximum and the photocurrent decays to dark current within 200s.The sensitivity and stability of the photoresponse indicate that it is possible for TiO2 thin films to be a new UV detector material.关键词
直流反应磁控溅射/二氧化钛薄膜/光响应/光电流Key words
DC reactive magnetron sputtering/TiO2 thin films/photoresponse/photocurren分类
数理科学引用本文复制引用
张利伟,张兵临,姚宁,樊志琴,杨仕娥,鲁占灵..直流反应磁控溅射法制备二氧化钛薄膜的光响应[J].人工晶体学报,2004,33(4):667-669,617,4.
