人工晶体学报2009，Vol.38Issue(3)：732-737,6.
利用直流磁控溅射法在柔性衬底上制备ZnO: Zr新型透明导电薄膜
A Novel Transparent Conducting Zno:Zr Films Deposited on ZnO-buffered Flexible Substrates by DC Magnetron Sputtering
摘要
Abstract
Transparent conducting Zr-doped ZnO(ZnO:Zr) thin films with high transparency and low resistivity were successfully prepared on ZnO-buffered polyethylene glycol terephthalate (PET) by DC magnetron sputtering at room temperature. The effects of the thickness on the structural, electrical and optical properties of the films were studied in detail. The experimental results reveal that all the deposited films are polycrystalline with a hexagonal structure. The lowest resistivity achieved is 2.4×10-3 Ω·cm for a thickness of 151 nm with a Hall mobility of 18.9 cm2·V-1·s-1 and a carrier concentration of 2.3×1020 cm-3 . All the films present a high transmittance of above 92% in the wavelength range of the visible spectrum.关键词
ZnO∶Zr薄膜/柔性衬底/直流磁控溅射/透明导电薄膜Key words
ZnO: Zr thin films/flexible substrate/DC magnetron sputtering/transparent conducting film分类
数理科学引用本文复制引用
张化福,类成新,刘汉法,袁长坤..利用直流磁控溅射法在柔性衬底上制备ZnO: Zr新型透明导电薄膜[J].人工晶体学报,2009,38(3):732-737,6.
