分析测试学报2009，Vol.28Issue(7)：780-783,4.DOI:10.3969/j.issn.1004-4957.2009.07.005
直流磁控溅射Au膜的微观应变研究
The Microstrains Study of Au Films Prepared by DC Magnetron Sputtering
摘要
Abstract
Au films with two thicknesses of 108.4 and 215.6 nm were prepared by DC magnetron sputtering and analyzed by X-ray diffraction under the CBD scan mode.The microstrains of Au films were directly determined by X-ray diffraction spectra.The results showed that the films grew along the <111> direction parallel to the substrate surface.The breadths of diffraction profiles were mainly caused by lattice distortion.The microstrain of 215.6 and 108.4 nm Au film were 0.065 and 0.055,respectively.关键词
X射线衍射/薄膜/微观应变/晶格畸变Key words
X-ray diffraction/film/microstrain/lattice distortion分类
数理科学引用本文复制引用
江锡顺,宋学萍,孙兆奇..直流磁控溅射Au膜的微观应变研究[J].分析测试学报,2009,28(7):780-783,4.基金项目
国家自然科学基金资助项目(50872001) （50872001）
教育部博士点专项基金资助项目(20060357003) （20060357003）
安徽省高校青年教师科研资助研究项目(2008jq1114) （2008jq1114）
