XPS研究Nd表面氧化物的生长过程OA北大核心CSCD
A STUDY ON OXIDE FILM GROWTH ON Nd SURFACE USING XPS
用X射线光电子能谱(XPS)研究新鲜Nd表面在不同氧气和空气进气量的情况下，表面氧化物的生长过程.发现氧化层由氧化物、氢氧化物及表面化学吸附水三种成分，这三种成分的增加与进气量都存在正比对数关系，氧化物和吸附水在一定进气量后趋于饱和，而氢氧化物持续不断增加，最终氢氧化物占据主要地位.
X-ray photoelectron spectroscopy(XPS) has been used to follow oxide film growth on pure Nd surface over a wide range of exposure to oxygen and air.Oxide film was noticed to consist of oxide,hydroxide and chemically absorbed water,all of which exhibited logarithmic-type growth kinetics.The oxide and chemically absorbed water stop growing after a certain exposure,whereas the hydroxide,which plays a significant role ultimately,shows continued and persistent growth.
李雅;陈玲燕;张哲;吴永刚;乔轶;徐炜新
同济大学波耳固体物理研究所,同济大学波耳固体物理研究所,同济大学波耳固体物理研究所,同济大学波耳固体物理研究所,同济大学波耳固体物理研究所,上海金属实验室,
数理科学
X射线光电子能谱(XPS)Nd氧化
《物理学报》 2001 (1)
79-82,4
国家高技术研究发展计划(批准号：863-410-3-9)资助的课题. Project supported by the Fnmdation of High Technology Research and Development Plan of China (Grant No.863-410-3-9)
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