物理学报2001，Vol.50Issue(1)：79-82,4.
XPS研究Nd表面氧化物的生长过程
A STUDY ON OXIDE FILM GROWTH ON Nd SURFACE USING XPS
摘要
Abstract
X-ray photoelectron spectroscopy(XPS) has been used to follow oxide film growth on pure Nd surface over a wide range of exposure to oxygen and air.Oxide film was noticed to consist of oxide,hydroxide and chemically absorbed water,all of which exhibited logarithmic-type growth kinetics.The oxide and chemically absorbed water stop growing after a certain exposure,whereas the hydroxide,which plays a significant role ultimately,shows continued and persistent growth.关键词
X射线光电子能谱(XPS)/Nd/氧化分类
数理科学引用本文复制引用
李雅,陈玲燕,张哲,吴永刚,乔轶,徐炜新..XPS研究Nd表面氧化物的生长过程[J].物理学报,2001,50(1):79-82,4.基金项目
国家高技术研究发展计划(批准号：863-410-3-9)资助的课题. Project supported by the Fnmdation of High Technology Research and Development Plan of China (Grant No.863-410-3-9) （批准号：863-410-3-9）
