红外技术2001，Vol.23Issue(1)：8-10，14,4.
CdTe钝化介质膜的溅射沉积及其X射线光电子能谱研究
The Sputtering Deposition and the X-ray Photoelectron Spectroscopy Study for the CdTe Thin Film
周咏东 1李言谨 2吴小山 3徐国森 2方家熊 2汤定元2
作者信息
- 1. 南京大学固体微结构物理实验室,
- 2. 中国科学院,上海技术物理研究所,上海,200083
- 3. 南京大学,固体微结构物理实验室,江苏,南京,210093
- 折叠
摘要
Abstract
The CdTe film was grown by using the low-temperature ion beam sputtering technique. The Cd and Te elements in the sputtering CdTe film sample were studied and compared with those in the CdTe bulk using X-ray photoelectron spectroscopy (XPS) technique. It is proved that the constituent elements in the sputtering CdTe film are homogeneous. No element deposition (Cd, Te) is detceted.关键词
CdTe/离子束溅射沉积/XPS/HgCdTe/表面钝化分类
信息技术与安全科学引用本文复制引用
周咏东,李言谨,吴小山,徐国森,方家熊,汤定元..CdTe钝化介质膜的溅射沉积及其X射线光电子能谱研究[J].红外技术,2001,23(1):8-10，14,4.
