红外与毫米波学报2006，Vol.25Issue(2)：81-85,5.
热丝化学气相沉积法在CH4/H2混合气体中低温生长超薄纳米金刚石膜
LOW-TEMPERATURE GROWTH OF ULTRA-THIN NANO-CRYSTALLINE DIAMOND FILMS BY HFCVD IN A CH4/H2 MIXTURE
摘要
Abstract
The diamond nucleation and growth on Si substrate by hot filament chemical vapor deposition (HFCVD) at the low temperature ( ～ 550℃ ) and low pressure ( ～ 7 Torr) were studied. Nucleation density (ND) as high as 1.5 × 1011cm-2 was obtained on well ultrasonically pretreated substrate at the nucleation conditions of 2.5% CH4/H2. Diamond grain sizes change form sub-micron to nano-meter scales with the increase of CH4 concentration. Smooth ultra-thin (thickness ＜500 nm) nano-crystalline diamond (NCD) films with grain sizes less than 50 nm and surface roughness as low as 4nm have been synthesized. The adhesion between the film and substrate is good. The optical absorption coefficient in visible (VIS)to infrared (IR) wavelength range is less than 2 × 104cm-1. Smooth ultra-thin NCD films can be synthesized at low temperature and low pressure by our conventional HFCVD technique.关键词
热丝化学气相沉积/纳米金刚石膜/超声波预处理/低温生长/光吸收系数Key words
HFVCD/nano-crystalline diamond film/ultrasonic pretreatment/low temperature growth/absorption coefficient分类
数理科学引用本文复制引用
张衡,郝天亮,石成儒,韩高荣..热丝化学气相沉积法在CH4/H2混合气体中低温生长超薄纳米金刚石膜[J].红外与毫米波学报,2006,25(2):81-85,5.基金项目
The project supported by the Natural Science Foundation of Zhejiang Province, China (No. 597083 ) （No. 597083 ）
