衬底材料对制备立方氮化硼薄膜的影响OA北大核心CSCD
INFLUENCE OF SUBSTRATES ON THE FORMATION OF c-BN THIN FILMS
较系统地研究了不同衬底材料对制备立方氮化硼薄膜的影响.用热丝增强射频等离子体CVD法，以NH3，B2H6和H2为反应气体，在Si,Ni,Co和不锈钢等衬底材料上，成功生长出高质量的立方氮化硼薄膜.还用13.56MHz的射频溅射系统将c-BN薄膜沉积在Si衬底上，靶材为h-BN(纯度99.99%)，溅射气体为氩气和氮气的混合气体，所得到的氮化硼薄膜中立方相含量高于90%.用X射线衍射谱和傅里叶变换红外谱对样品进行的分析表明，衬底材料与c-BN的晶格…查看全部>>
The influence of substrates on the formation of cubic boron nitride(c-BN) thin films was reported.The c-BN thin films were deposited on different substrates with hot-filament-assisted plasma CVD and RF sputter.In the CVD method,NH3,B2H6 and H2 were reacting gases,and Si,Ni,Co,stainless steel and other materials were substrates.The experiments showed that the cubic phase content in c-BN thin films was affected by substrates.The film on Ni substrate was the be…查看全部>>
陈光华;邓金祥;张生俊;宋雪梅;王波;严辉
北京工业大学材料学院,北京工业大学材料学院,北京工业大学材料学院,北京工业大学材料学院,北京工业大学材料学院,北京工业大学材料学院,
数理科学
立方氮化硼薄膜衬底热丝CVD射频溅射
《物理学报》 2001 (1)
83-87,5
国家自然科学基金(批准号：69876003，19874007)和北京市自然科学基金资助的课题. Project supported by the National Natural Science Foundation of China (Grant No.69876003,19874007).
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