材料科学与工程学报2007，Vol.25Issue(6)：850-853,4.
非平衡磁控溅射技术制备用于红外减反射的无氢碳膜
Hydrogen-free Carbon Films by Unbalanced Magnetron Sputtering for Infrared Anti-reflection Coatings
徐均琪 1樊慧庆 2刘卫国 1杭凌侠2
作者信息
- 1. 西北工业大学材料学院,凝固技术国家重点实验室,陕西,西安,710072
- 2. 西安工业大学光电工程学院,陕西,西安,710032
- 折叠
摘要
Abstract
The hydrogen-free diamond-like carbon (DLC) films are potential materials to be used as infrared anti-reflection protective coatings if their optical absorption can be reduced to get relatively thick films needed. In this study, hydrogen-free DLC films were deposited in an unbalanced magnetron sputtering (UBMS) system. The results of film thickness uniformity showed that this system is capable of depositing uniform films larger than 150 mm in diameter. The infrared transmission spectra of DLC films indicating that transparent films were obtained in the infrared region for the single side DLC coated on the silicon and germanium substrates, and about 68.83% and 63.05% transmittance were achieved respectively at the wave number of 2983/cm, close to theoretical value for non-absorption carbon material. No obvious absorption peaks were found between 5000 and 800 /cm. These excellent characteristics show that the hydrogen-free DLC films prepared in the UBMS system were suitable for infrared transmission enhancement applications.关键词
类金刚石膜(DLC)/非平衡磁控溅射(UBMS)/厚度均匀性/物理气相沉积(PVD)Key words
diamond-like carbon films (DLC)/ unbalanced magnetron sputtering (UBMS)/ thickness uniformity/ physical vapor deposition (PVD)分类
数理科学引用本文复制引用
徐均琪,樊慧庆,刘卫国,杭凌侠..非平衡磁控溅射技术制备用于红外减反射的无氢碳膜[J].材料科学与工程学报,2007,25(6):850-853,4.
