人工晶体学报2008，Vol.37Issue(4)：857-861,5.
直流磁控反应溅射法制备工艺参数对TiO2薄膜光催化性能的影响
Effect of Preparation Parameters on Photocatalytic Activity of TiO2 Films Prepared by DC Reactive Magnetron Sputtering Method
赵琳 1邱家稳 1何延春1
作者信息
- 1. 兰州物理研究所表面工程技术国家级重点实验室,兰州,730000
- 折叠
摘要
Abstract
TiO2 thin films were deposited by direct current (DC) magnetron reactive sputtering without external heating. Photocatalytic activity of the samples was tested by degradation of methylene blue solution under irradiation of a UV lamp. The effect of different preparation parameters on photocatalytic activity was investigated. The results show that the thicker film annealed at 500 ℃ has better photocatalytic activity; Thin films deposited with lower source power and lower Ar/O2 flow ratio display better photocatalytic activity when their thicknesses are similar.关键词
TiO2薄膜/磁控溅射/光催化/制备工艺参数Key words
TiO2 thin films/maganetron sputtering/photocatalytie/preparation parameter分类
数理科学引用本文复制引用
赵琳,邱家稳,何延春..直流磁控反应溅射法制备工艺参数对TiO2薄膜光催化性能的影响[J].人工晶体学报,2008,37(4):857-861,5.
