青岛大学学报（自然科学版）2011，Vol.24Issue(1)：38-41,4.DOI:10.3969/j.issn.1006-1037.2011.01.010
溅射气压对ZnO薄膜的影响
Effects of Sputtering Pressure on Structure of ZnO Films Prepared by RF Magnetron Sputtering
孙海燕 1耿广州 1黄家寅 1单福凯 2LEE Won-jae3
作者信息
- 1. 青岛大学物理科学学院,山东,青岛,266071
- 2. 青岛大学物理科学学院,山东,青岛,26607
- 3. 青岛大学青岛大学纤维新材料与现代纺织国家重点实验室培育基地,山东,青岛,266071
- 折叠
摘要
Abstract
ZnO films with preferred (002) orientation were prepared on glass substrates by radio frequency (RF) magnetron sputtering at different pressures. XRD, SEM, AFM were employed to analyze the influence of the pressure on the structures, thicknesses and morphologies of ZnO thin films. Results show that the films present higher c-axis orientation and the sputtering rate changes from 4.2 nm/min to 21 nm/min with the decrease of the sputtering pressure. The surface roughness showed as small as 5.45 nm at 2.5 Pa.关键词
氧化锌/磁控溅射/气压/X-射线衍射仪Key words
ZnO/ RF sputtering/ pressure/ X-ray diffraction分类
数理科学引用本文复制引用
孙海燕,耿广州,黄家寅,单福凯,LEE Won-jae..溅射气压对ZnO薄膜的影响[J].青岛大学学报（自然科学版）,2011,24(1):38-41,4.
