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157nm激光微加工过程中激光参量对刻蚀性能的影响

戴玉堂 崔健磊 徐刚 白帆

激光技术2011,Vol.35Issue(1):36-38,85,4.
激光技术2011,Vol.35Issue(1):36-38,85,4.DOI:10.3969/j.issn.1001-3806.2011.01.011

157nm激光微加工过程中激光参量对刻蚀性能的影响

Influence of laser parameters on etching performance during 157nm laser micromachining

戴玉堂 1崔健磊 1徐刚 1白帆1

作者信息

  • 1. 武汉理工大学,光纤传感技术与信息处理教育部重点实验室,武汉,430070
  • 折叠

摘要

Abstract

To investigate the effect of 157nm laser parameters on the ablation performance, two wide hand-gap materials (fused silica and sapphire) were employed in 157nm laser micromachining experiments, and ideal parameter range of laser process was obtained. The ablation rate of sapphire is approximately half of that of fused silica, and the ablated surface of sapphire is much rougher than that of fused silica. With the increase of etching depth, the generated particles are difficult to escape from microstructures so that the ablation rate decreases. For laser scanning, higher velocity and lower pulse repetition rate are favorable for reducing the surface roughness. Experimental results show that, for the etching of nonmetal materials, the laser fluence should be controlled 2.5 times~4 times of energy threshold of the ablated material, so as to get better etching effect.

关键词

激光技术/157nm激光/激光参量/刻蚀效率/刻蚀质量

Key words

laser technique/ 157nm laser/ laser parameter/ etching efficiency/ etching quality

分类

信息技术与安全科学

引用本文复制引用

戴玉堂,崔健磊,徐刚,白帆..157nm激光微加工过程中激光参量对刻蚀性能的影响[J].激光技术,2011,35(1):36-38,85,4.

基金项目

国家自然科学基金资助项目(50775169) (50775169)

激光技术

OA北大核心CSCDCSTPCD

1001-3806

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