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石墨烯的化学气相沉积法制备

任文才 高力波 马来鹏 成会明

新型炭材料2011,Vol.26Issue(1):71-80,10.
新型炭材料2011,Vol.26Issue(1):71-80,10.

石墨烯的化学气相沉积法制备

Preparation of graphene by chemical vapor deposition

任文才 1高力波 1马来鹏 1成会明1

作者信息

  • 1. 中国科学院金属研究所,沈阳材料科学国家(联合)实验室,辽宁沈阳,110016
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摘要

Abstract

Chemical vapor deposition ( CVD) is an effective way for the preparation of graphene with large area and high quality. In this review, the mechanism and characteristics of the four main preparation methods of graphene are briefly introduced, including micromechanical cleavage, chemical exfoliation, SiC epitaxial growth and CVD. The recent advances in the CVD growth of graphene and the related transfer techniques in terms of structure control , quality improvement and large area graphene synthesis were discussed. Other possible methods for the CVD growth of graphene were analyzed including the synthesis and nondestructive transfer of large area single crystalline graphene, graphene nanoribbons and graphene macrostructures.

关键词

石墨烯/制备/化学气相沉积法/转移

分类

化学化工

引用本文复制引用

任文才,高力波,马来鹏,成会明..石墨烯的化学气相沉积法制备[J].新型炭材料,2011,26(1):71-80,10.

基金项目

国家自然科学基金(50872136,50972147,50921004)、中国科学院知识创新项目(KJCX2-YW-231). (50872136,50972147,50921004)

新型炭材料

OA北大核心CSCDCSTPCDSCI

1007-8827

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