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首页|期刊导航|半导体学报|Surface reconstructions and reflection high-energy electron diffraction intensity oscillations during homoepitaxial growth on nonmisoriented GaAs(111)B by MBE

Surface reconstructions and reflection high-energy electron diffraction intensity oscillations during homoepitaxial growth on nonmisoriented GaAs(111)B by MBE

Yang Ruixia Wu Yibin Niu Chenliang Yang Fan

半导体学报2010,Vol.31Issue(11):1-4,4.
半导体学报2010,Vol.31Issue(11):1-4,4.DOI:10.1088/1674-4926/31/11/113001

Surface reconstructions and reflection high-energy electron diffraction intensity oscillations during homoepitaxial growth on nonmisoriented GaAs(111)B by MBE

Surface reconstructions and reflection high-energy electron diffraction intensity oscillations during homoepitaxial growth on nonmisoriented GaAs(111)B by MBE

Yang Ruixia 1Wu Yibin 2Niu Chenliang 1Yang Fan1

作者信息

  • 1. School of Information Engineering,Hebei University of Technology,Tianjin 300130,China
  • 2. The 13th Electronic Research Institute,CETC,Shijiazhuang 050051,China
  • 折叠

摘要

关键词

GaAs(111)B/RHEED/surface reconstruction/epilayer

Key words

GaAs(111)B/RHEED/surface reconstruction/epilayer

引用本文复制引用

Yang Ruixia,Wu Yibin,Niu Chenliang,Yang Fan..Surface reconstructions and reflection high-energy electron diffraction intensity oscillations during homoepitaxial growth on nonmisoriented GaAs(111)B by MBE[J].半导体学报,2010,31(11):1-4,4.

基金项目

Project supported by the National Natural Science Foundation of China (No.61076004) and the Natural Science Foundation of Hebei Province, China (No. E2009000050). (No.61076004)

半导体学报

OA北大核心CSCDCSTPCDEI

1674-4926

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