浙江大学学报（理学版）2011，Vol.38Issue(1)：41-45,5.DOI:10.3785/j.issn.1008-9497.2011.01.011
基于支持向量机及遗传算法的光刻热点检测
Lithographic hotspot detection based on SVM and genetic algorithm
摘要
Abstract
A lithography hotspot detection method based on support vector machine (SVM) and genetic algorithm (GA) is proposed. Frequency domain features of integrated circuit (IC) layout samples are first extracted with discrete cosine transformation. Then SVM classifiers are trained with the layout samples so that it can be used for hotspot detection. To improve the precision and efficiency of this method, genetic algorithm is used for feature selection and SVM parameter optimization. Experiment results show that the proposed method can improve the precision of lithography hotspot detection effectively.关键词
可制造性设计/光刻热点/离散余弦变换/支持向量机/遗传算法分类
计算机与自动化引用本文复制引用
曹葵康,沈海斌,杨祎巍..基于支持向量机及遗传算法的光刻热点检测[J].浙江大学学报（理学版）,2011,38(1):41-45,5.基金项目
国家自然科学基金资助项目(60720106003). （60720106003）
