物理学报2011，Vol.60Issue(5)：692-696,5.
Al/ZnO/Al薄膜的结构与磁性分析
Microstructures and magnetic analyses of Al/ZnO/Al thin films
摘要
Abstract
Al/ZnO/Al thin films are prepared on the glass substrates by dc magnetron sputtering and annealed in vacuum and atmosphere, separately. The crystal structures are analyzed by X-ray diffraction (XRD), and the magnetic properties are measured by a Physical Properties Measurement System (PPMS) with a magnetic field parallel to the films plane. The XRD results indicate that the microstructures of thin films are greatly influenced by the annealing aura. In this paper, an improved corrected method to subtract the signal of the substrate is suggested. Simultaneously, the maximum fitting error of substrate is calculated, and the magnetic properties of the modified films are discussed. The results show that the room temperature ferromagnetism may be related to the charge transfer between Al and Zn and the variational position of Al in ZnO films in different annealing conditions.关键词
Al/ZnO/Al薄膜/铁磁性/磁性表征Key words
Al/ZnO/Al films/ ferromagnetic/ magnetron characterization引用本文复制引用
岂云开,顾建军,刘力虎,张海峰,徐芹,孙会元..Al/ZnO/Al薄膜的结构与磁性分析[J].物理学报,2011,60(5):692-696,5.基金项目
河北省自然科学基金(批准号:A2009000254),河北师范大学博士基金(批准号:L2006B10),河北省新型薄膜材料重点实验室开放课题项目资助的课题. （批准号:A2009000254）
