强激光与粒子束2011，Vol.23Issue(5)：1299-1302,4.DOI:10.3788/HPLPB20112305.1299
在19.5nm处高反在30.4nm处抑制的双功能薄膜
Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm
摘要
Abstract
A dual-functional extreme ultraviolet(EUV) muhilayer(ML) mirror was designed for high-reflectivity at 19.5 nm ( Fe Ⅶ line ) and low-reflectivity at 30.4 nm ( He Ⅱ line ). The design based on genetic algorithm(GA) utilized a stack composed of two periodic multilayers: a bottom multilayer for high reflectivity at 19. 5 nm, and a top multilayer for low-reflectivity at 30.4 nm. The multilayer mirror was prepared by direct current magnetron sputtering, and characterized by grazing-incident X-ray diffraction(XRD) and synchrotron radiation(SR). The experiment results show that the dual-functional multilayer achieves the reflectivity of 33.3％ at 19. 5 nm and 9.6× 10-4 at 30.4 nm at incident angle of 13°.关键词
双功能/多层膜/极紫外/直流磁控溅射/同步辐射Key words
dual-functional/ multilayer/ extreme ultraviolet/ direct current magnetron sputtering/ synchrotron radiation分类
数理科学引用本文复制引用
蒋励,王晓强,谭默言,黄秋实,李浩川,周斯卡,朱京涛,王占山..在19.5nm处高反在30.4nm处抑制的双功能薄膜[J].强激光与粒子束,2011,23(5):1299-1302,4.基金项目
国家自然科学基金项目(10825521) （10825521）
上海市科委资助项目(09XD1404000) （09XD1404000）
科技部国际合作项目(2008DFA01920) （2008DFA01920）
