福建师范大学学报（自然科学版）2011，Vol.27Issue(2)：57-61,5.
基片温度对氧化铋薄膜光学性质的影响
Effect of Substrate Temperature on Optical Properties of Bismuth Oxide Thin Films
摘要
Abstract
Bismuth oxide films were deposited on glass substrates by direct current magnetron sputtering and the substrate temperature was changed from RT to 300 ℃. The effect of substrate temperature on the optical properties of the films was investigated. The microstructure, surface morphology and transmittance of the films were measured by X-ray diffraction, atomic force microscopy and spectrophotometer, respectively. Experimental results showed that the intensity of Bi2Oa (120) peak became stronger and the surface particle size become smaller as the increasing of substrate temperature, Bi2O2.7s (006) peak appeared when the substrate temperatures were 250 ℃ and 300 ℃. The refractive index,extinction coefficient and film thickness of the films were calculated by fitting transmittance spectrum data, and then optical band gap was calculated. The results showed that with the increasing of temperature the refractive index was smaller, and extinction coefficient ranged between 10－2 and 10－1 The optical band gap decreased between 3.51 eV and 3.04 eV.关键词
氧化铋/薄膜/基片温度/光学性质Key words
bismuth oxide/ films / substrate temperature/ optical properties分类
数理科学引用本文复制引用
郑明志,吕佩伟,林丽梅,瞿燕,赖发春..基片温度对氧化铋薄膜光学性质的影响[J].福建师范大学学报（自然科学版）,2011,27(2):57-61,5.基金项目
国家自然科学基金资助项目(11074041) （11074041）
福建省教育厅资助项目(JA08048 （）
JB08065) （）
