人工晶体学报2011，Vol.40Issue(2)：430-434,5.
射频反应磁控溅射制备ZnO薄膜的微结构及其光学性能
Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering
摘要
Abstract
The c-axis preferred orientation ZnO films was deposited on quartz and Si substrates using RF reactive magnetron sputtering.The O2: Ar flow ratio was 10: 40, 20: 40, 30:40 and 40:40 during the magnetron sputtering process.The microstructure and optical properties of ZnO films were investigated by X-ray diffraction, stylus profilometer,atomic force microscope and ultraviolet-visible spectrum.The results indicated that ZnO films prepared at 30:40 had the best crystal quality.The average transmission of ZnO thin films are above 87％.As the O2: Ar ratio increasing, the transmission of ZnO thin films change nonmonotonically and reach a maximum of above 93％ at 30: 40.The optical band gap of ZnO films first increases and then decreases as O2: Ar ratio increasing.Compared with the optical band gap(3.37 eV) of buck ZnO, the band gap of all ZnO films become narrow.关键词
射频反应磁控溅射/ZnO薄膜/微结构/光学性能Key words
RF reactive magnetron sputtering/ ZnO thin films/ microstructure/ optical properties分类
数理科学引用本文复制引用
夏齐萍,汪小小,吕建国,宋学萍,孙兆奇..射频反应磁控溅射制备ZnO薄膜的微结构及其光学性能[J].人工晶体学报,2011,40(2):430-434,5.基金项目
国家自然科学基金(50872001,51072001) （50872001,51072001）
教育部博士点专项基金(20060357003) （20060357003）
安徽省人才专项基金(2004Z029) （2004Z029）
安徽高校省级自然科学研究重点项目(KJ2010A284) （KJ2010A284）
