物理学报2011，Vol.60Issue(4)：681-686,6.
离子束溅射制备Nb2O5光学薄膜的特性研究
Characteristics of Nb2 O5 thin films deposited by ion beam sputtering
摘要
Abstract
Optical properties, stress and microstructure of Nb2O5 thin films prepared by ion beam sputtering ( IBS ) are investigated, and the effects of assist ion beam energy and ion current on characteristics of Nb2O5 thin films are systematically discussed. The results show that with different parameters of assisted ion source, the refractive index changes from 2.310 to 2. 276 and residual stress varies from -281 MPa to - 152 MPa. The extinction coefficient of Nb2O5 can be under 10-4, and the surface is very smooth in an optimum deposition condition. Thin films deposited by IBS exhibit better optical properties and microstructures than those deposited by ion assisted deposition (IAD).关键词
Nb2O5薄膜/离子束溅射/光学特性/应力Key words
Nb2O5thin films/ ion beam sputtering/ optical properties/ stress引用本文复制引用
袁文佳,章岳光,沈伟东,马群,刘旭..离子束溅射制备Nb2O5光学薄膜的特性研究[J].物理学报,2011,60(4):681-686,6.基金项目
国家自然科学基金(批准号:60708013,60608014)和浙江省自然科学基金(批准号:Y1090504)资助的课题. （批准号:60708013,60608014）
