物理学报2011，Vol.60Issue(3)：689-695,7.
磁控溅射制备Y2O3-TiO2薄膜形貌的研究
Analysis of Y2 O3 doped TiO2 films topography prepared by radio frequency magnetron sputtering
摘要
Abstract
Y2O3-Ti02 composite film were deposited on Si substrate at room temperature by means of radio frequency magnetron sputtering. The crystalline state and topography of the film before and after annealing were measured by XRD and AFM, and the mechanism of the film being more compact was discussed. The result revealed that the evenness and compactness of the film can be improved with increasing the sputtering power, which is due to the fact of more Y2O3 filling the pores around TiO2with raising sputtering power, which inhibited the growth of big TiO2 grains and improved the evenness and compactness of film. After annealing, XRD pattern indicated that the addition of Y2O3 favors the formation of rutile TiO2 film which has high-dielectric constant.关键词
Y2O3-TiO2薄膜/表面形貌/原子力显微镜/磁控溅射Key words
Y203-TiO2 composite film/ topography/ atomic force microscopy/ magnetron sputtering引用本文复制引用
曹月华,狄国庆..磁控溅射制备Y2O3-TiO2薄膜形貌的研究[J].物理学报,2011,60(3):689-695,7.基金项目
江苏省高校自然科学重大基础研究项目(批准号:05KJA43006)资助的课题. （批准号:05KJA43006）
