红外与毫米波学报2011，Vol.30Issue(3)：237-241,5.
等离子体辅助电子束蒸发低温制备SiO2纳光子薄膜
Low-temperature deposition of SiO2 nanophotonic film
摘要
Abstract
SiO2 nanophotonic film is widely used in the areas of photovoltaic, nanophotonies and microelectronics. Plasmaassisted electron beam evaporation was used to produce the SiO2/Si nano-film at low temperature. By using the ellipsometric method,we studied the optical properties of the nano-films under three different process conditions, such as deposition rate, substrate temperature and radio-frequency power. The best condition to make the SiO2/Si nano-film was obtained. The studies of the mechanical, chemical and optical properties of the SiO2/Si nanoflim show that the nano-film prepared with plasma assisted electron beam evaporation under the best condition is superior to that produced by the conventional methods.关键词
等离子体辅助/电子束蒸发/纳光子薄膜Key words
plasma assistant/electron beam evaporation/ nanophotonic film分类
数理科学引用本文复制引用
盛明裕,赵源,刘富强,胡巧多,郑玉祥,陈良尧..等离子体辅助电子束蒸发低温制备SiO2纳光子薄膜[J].红外与毫米波学报,2011,30(3):237-241,5.基金项目
上海市教委创新项目(10YZ213) （10YZ213）
