半导体学报2011，Vol.32Issue(5)：32-35,4.DOI:10.1088/1674-4926/32/5/053005
Material properties and effective work function of reactive sputtered TaN gate electrodes
Material properties and effective work function of reactive sputtered TaN gate electrodes
摘要
关键词
metal gate/thermal stability/effective work function/dipoleKey words
metal gate/thermal stability/effective work function/dipole引用本文复制引用
Zhang Manhong,Huo Zongliang,Wang Qin,Liu Ming..Material properties and effective work function of reactive sputtered TaN gate electrodes[J].半导体学报,2011,32(5):32-35,4.基金项目
Project supported by the State Key Development Program for Basic Research of China (No.2010CB934204),the National Natural Science Foundation of China (No.60825403),and the National Key Projects of China (Nos.2009ZX-02302-004,20092X02023-005). （No.2010CB934204）
