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NEA GaN光电阴极的制备与评估

高频 王晓晖 杜玉杰 李彪 付晓倩

红外技术2011,Vol.33Issue(6):332-335,4.
红外技术2011,Vol.33Issue(6):332-335,4.

NEA GaN光电阴极的制备与评估

Preparation and Evaluation of NEA GaN Photocathode

高频 1王晓晖 1杜玉杰 1李彪 1付晓倩1

作者信息

  • 1. 南京理工大学电子工程与光电技术学院,江苏,南京,210094
  • 折叠

摘要

Abstract

The structural properties of GaN are introduced in this paper, and the preparation method of NEA GaN photocathode is studied. 150 nm thick GaN samples with p-type doping concentration of 1.6 × 1017cm-3 are grown by MOCVD. After the GaN surface cleaning the atomic clean surface was get, and the GaN photocathode was activated by Cs/O in the ultra-high vacuum system, then the NEA GaN photocathode was obtained. After the successful activation, NEA GaN photocathode was tested by Multi-information test system prepared by our laboratory. The results shows that the reflection-mode QE of the NEA GaN photocathode reaches 30%, and the transmission-mode QE reaches 12%.

关键词

GaN光电阴极/NEA/制备工艺

Key words

GaN photocathode, NEA, Preparation technology

分类

信息技术与安全科学

引用本文复制引用

高频,王晓晖,杜玉杰,李彪,付晓倩..NEA GaN光电阴极的制备与评估[J].红外技术,2011,33(6):332-335,4.

基金项目

国家自然科学基金项目,编号:60871012. ()

红外技术

OA北大核心CSCDCSTPCD

1001-8891

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