人工晶体学报2011，Vol.40Issue(3)：727-730,736,5.
溅射功率对铝铬共掺杂氧化锌透明导电薄膜特性的影响
Influence of Sputtering Power on the Properties of Transparent Conducting Al-Cr Co-doped ZnO Thin Films
摘要
Abstract
A series of ZnO thin films doped with aluminum and chromium were deposited on glass substrates at room temperature by direct current magnetron sputtering. The influence of sputtering power (55-130 W)on the structure, residual stress,surface morphology,photoelectric properties of the films were studied. The results indicated that as the sputtering power increasing, the crystalline structure of the films improved, the ZnO (002) preferred orientation enhanced. The lattice constant, the compressive stress and electrical resistivity decreases gradually as the sputtering power increasing. The lowest electrical resistivity for ZnO∶ Al,Cr films was 1.09 × 10.-3 Ω · cm when the sputtering power was 130 W.The optical band gap was found to be 3.39 eV for 55 W and it increases to 3.45 eV for 130 W. The UVvis transmittance spectrum revealed that the films show a high average transmittance of above 89％ in the visible range.关键词
溅射功率/磁控溅射/ZnO:Al,Cr薄膜Key words
sputtering power/ magnetron sputtering/ ZnO∶ Al, Cr films分类
数理科学引用本文复制引用
周爱萍,张化福,刘汉法..溅射功率对铝铬共掺杂氧化锌透明导电薄膜特性的影响[J].人工晶体学报,2011,40(3):727-730,736,5.基金项目
The project supported by Shandong Province Natural Science Foundation( No.ZR2009GQ011 ) （ No.ZR2009GQ011 ）
