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氧化物晶体与薄膜最新研究进展

木村秀夫 赵洪阳 姚启文 程振祥 王小林

人工晶体学报2011,Vol.40Issue(3):789-795,7.
人工晶体学报2011,Vol.40Issue(3):789-795,7.

氧化物晶体与薄膜最新研究进展

Research Progress on Oxide Crystals and Thin Films

木村秀夫 1赵洪阳 1姚启文 1程振祥 2王小林2

作者信息

  • 1. 日本国立物质材料研究机构,筑波3050047
  • 2. 澳大利亚卧龙岗大学电子材料研究所,新南威尔士州2519
  • 折叠

摘要

Abstract

Oxide materials are most popular in electronics field from the industrial revolutions. Up to the present, research trend is down sizing to a small scale even in oxide crystals from the viewpoint of nanotechnology. Research target is also changed dramatically for several years. Here author's three research topics that related to oxide bulk single crystals and thin films are introduced.

关键词

体晶体/薄膜/压电性/铁电性/多铁性/光催化

Key words

bulk crystals/ thin films/ piezoelectric/ ferroelectric/ multiferroic/ photocatalyst

分类

数理科学

引用本文复制引用

木村秀夫,赵洪阳,姚启文,程振祥,王小林..氧化物晶体与薄膜最新研究进展[J].人工晶体学报,2011,40(3):789-795,7.

基金项目

Project supported by grants from JSPS Grant-in-Aid for Scientific Research (C) (21605012),Grant-in-Aid for JSPS Fellows (21-09608 and 22-00796),JSPS and ARC under Japan-Australia Research Cooperative Program (C)

人工晶体学报

OA北大核心CSCDCSTPCD

1000-985X

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