液晶与显示2011，Vol.26Issue(3)：324-328,5.DOI:10.3788/YJYXS20112603.0324
ODF工艺中液晶滴下量的优化
Optimization of LC Drop Amount in ODF and PS Process
杨国波 1王永茂 1王向楠 1程石 1石天雷1
作者信息
- 1. 成都京东方光电科技股份有限公司,四川成都611731
- 折叠
摘要
Abstract
The impact of the LC dropping amount on the LC leak and cold bubble in the ODF process was researched, and the safe scope of the LC dropping amount was found out.Then, a new method to realize the ODF and PS linkage was developed, which can effectively solve LC leak and cold bubble problem of PS production in the ODF process.关键词
LCD/ODF/PS/漏液晶/低温气泡Key words
LCD/ ODF/ PS/ LC leak/ cold bubble分类
信息技术与安全科学引用本文复制引用
杨国波,王永茂,王向楠,程石,石天雷..ODF工艺中液晶滴下量的优化[J].液晶与显示,2011,26(3):324-328,5.
