物理化学学报2009，Vol.25Issue(12)：2427-2432,6.
含氟水溶液中电化学刻蚀氟化WO_3薄膜电极增强可见光光电化学性能
Enhanced Photoelectrochemical Performance of WO_3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine
摘要
Abstract
A new and simple method of electrochemical etching in acidic aqueous solutions containing fluorine for the electrodeposited WO_3 thin films is presented. The samples were characterized by photoelectrochemistry, scanning electron microscopy(SEAM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV-Vis diffuse reflectance spectroscopy, and photoluminescence (PL). Results showed that the etching increased the specific surface area with a concomitant reduction in the catalyst mass and also a change in the surface status of the electrodes. This modification of the surface status improved the photoelectrochemical performance of the electrodes under visible and UV-Vis light illumination with the same mass and specific surface area. This enhancement can be ascribed to the surface fluorination of the electrodes, which result in a decrease in the surface recombination centers and a negative shift in the flatband potential. The light absorption and crystalline were found to be unchanged by etching. The etched WO_3 film electrode shows excellent photoelectrochemical stability in acid solutions. This provides a novel method for increasing the photon electric conversion efficiency of WO_3 thin film electodes.关键词
WO_3/电化学刻蚀/氟化/光电化学/可见光Key words
WO_3/Electrochemical etching/Florination/Photoelectrochemisrty/Visible light分类
化学化工引用本文复制引用
李文,冷文华,牛振江,李想,费会,张鉴清,曹楚南..含氟水溶液中电化学刻蚀氟化WO_3薄膜电极增强可见光光电化学性能[J].物理化学学报,2009,25(12):2427-2432,6.基金项目
The project was supported by the National Natural Science Foundation of China(20373062).国家自然科学基金(20373062)资助项目 （20373062）
