华中科技大学学报：自然科学版2011，Vol.39Issue(7)：80-83,4.
基于SVM的刻蚀工艺失效状态识别
Failure recognition in etching processing by SVM
摘要
Abstract
The condition monitoring and recognition of reactive ion etching process were investigated. The principal component analysis （PCA） was used to compress data and extract feature subset having maximum impact from multiple parameters. Then the failure diagnosis and recognition model was es- tablished based on support vector machines （SVM） algorithm. The effect of model parameters on fail- ure recognition and classification was analyzed. The results indicate that the model is efficient for pat- tern recognition, and can be applied to other semiconductor process condition classification and recog- nition.关键词
刻蚀工艺/主元分析/支持向量机/状态识别/模式识别Key words
etching processing/principal component analysis （PCA）/support vector machine/staterecognition/pattern recognition分类
信息技术与安全科学引用本文复制引用
高阳,廖广兰,曹艳波,史铁林..基于SVM的刻蚀工艺失效状态识别[J].华中科技大学学报：自然科学版,2011,39(7):80-83,4.基金项目
国家重点基础研究发展计划资助项目 （）
国家自然科学基金资助项目（50805061,50975106）. （）
